Full Range of Electron Beam Evaporators for all Kind of Deposition

At a Glance

  • Evaporation area Ø 10 - 50 mm
  • Flux monitor
  • Integrated shutter
  • Rear-loading of evaporant
  • Fully bakeable up to 250 °C
  • A FOCUS product

The EFM 4 is intended for the deposition on substrates with a diameter up to 50 mm. Evaporation rates vary from 1/10 monolayer per minute to over 1000 monolayers per second.
The EFM 4 is suitable for crucible capacities up to 600 mm3. The effective water-cooling ensures low background pressure (typically in the 10-10 mbar range) even during prolonged operation at high evaporant temperatures.
The area of highly uniform deposition is selected by choosing one of three different exit apertures.