We offer the complete range of substrate preparation systems, including MBE, PLD, Sputtering and other techniques. Each thin film solution is prepared to and can be easily upgraded with more than 30 support techniques in-situ surface analysis.
A wide range of extremely precisely controllable electron beam evaporators (EFM-Series) for ultra-thin (submono)layer deposition using integrated flux-feedback control.
Various types of effusion cells for almost any applications are available, such as for metal layer growth, for semiconductor layer growth, for magnetic materials growth, for oxide layer growth and for organic layer growth, just to mention a few but not all.
We provide for hydrogen cracker sources, plasma sources, valved arsenic cracker sources, valved GaP compound sources and many others...
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