GCIB 10S

GCIB 10 S - an Argon Cluster Ion Beam system

The GCIB 10S is designed for ultimate depth profiling performance in combination with XPS and other surface analysis systems.

Cluster ion beams enable depth profiling analysis of polymers with minimal loss of chemical information due to ion beam damage. This is crucial in analysis of modern multi-layer structures, such as in OLED, bio medical, sensitive coatings devices or other polymer surfaces, but also shows a marked improvement in analysis of well-established materials which can degrade during normal profiling with Ar1.

Beyond using the argon cluster ion source in combination with new XPS systems the GCIB 10S can also be easily integrated into existing UHV systems with a suitable NW63CF flange aiming at the sample. It provides an economical means of upgrading XPS, SIMS or other systems to use cluster beam sputtering for sample cleaning or depth profile analysis.

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Depth profiling

Nondestructive depth profiling of Polystyrene on Kapton

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Sample current imaging

Ion beam alignment, focussing and raster size calibration made easy with an integrated sample current imaging capability

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Time of flight cluster measurement

A time of flight calibration feature is also built in, for accurate set up of cluster size. A selection of cluster beams are available, ranging from Ar1 to >Ar3000, with typical beam currents of up to 15 nA for the larger clusters.

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