The GCIB 10S is designed for ultimate depth profiling performance in combination with XPS and other surface analysis systems.
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Cluster ion beams enable depth profiling analysis of polymers with minimal loss of chemical information due to ion beam damage. This is crucial in analysis of modern multi-layer structures, such as in OLED, bio medical, sensitive coatings devices or other polymer surfaces, but also shows a marked improvement in analysis of well-established materials which can degrade during normal profiling with Ar1.
Beyond using the argon cluster ion source in combination with new XPS systems the GCIB 10S can also be easily integrated into existing UHV systems with a suitable NW63CF flange aiming at the sample. It provides an economical means of upgrading XPS, SIMS or other systems to use cluster beam sputtering for sample cleaning or depth profile analysis.