EFM 3i

Full Range of Electron Beam Evaporators for all Kind of Deposition

At a Glance

  • Ion-Beam-Assisted Deposition
  • Ion suppression
  • Evaporation area Ø 5 - 20 mm
  • Flux monito
  • Integrated shutter
  • A FOCUS product

Specifically designed for a smooth layer growth of difficult materials, the EFM 3i allows the controlled evaporation of the target material, and the generation of ions for Ion-Beam-Assisted Deposition (IBAD). The EFM 3i is based on the well-known EFM 3 evaporator, with the addition of the unique ion beam generation technology. The ions can be produced either by an intrinsic process from the evaporated target material, or from inert gases with the help of an integrated gas inlet. The ions are focussed onto the substrate by an electro-static lens.
Alternatively sensitive substrate materials can be protected against ion bombardment by a repelling lens voltage. The dedicated EVC 300i power supply supports not only the evaporation process but also supplies the lens voltage (up to 1100 V) and includes a sample current meter. The EFM 3i is compatible with the EVC 100/300 and NGEFM power supplies for the standard evaporator functionality.

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